Search results for "3RD-GENERATION PHOTOVOLTAICS"

showing 2 items of 2 documents

Light absorption and electrical transport in Si:O alloys for photovoltaics

2010

Thin films (100-500 nm) of the Si:O alloy have been systematically characterized in the optical absorption and electrical transport behavior, by varying the Si content from 43 up to 100 at. %. Magnetron sputtering or plasma enhanced chemical vapor deposition have been used for the Si:O alloy deposition, followed by annealing up to 1250 °C. Boron implantation (30 keV, 3-30× 1014 B/cm2) on selected samples was performed to vary the electrical sheet resistance measured by the four-point collinear probe method. Transmittance and reflectance spectra have been extracted and combined to estimate the absorption spectra and the optical band gap, by means of the Tauc analysis. Raman spectroscopy was …

Materials scienceAbsorption spectroscopyFour-pointAnalytical chemistryGeneral Physics and AstronomyAbsorption coefficientChemical vapor depositionBoron implantationSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materiasymbols.namesakeElectrical resistivity and conductivityPlasma-enhanced chemical vapor depositionThin filmAbsorption (electromagnetic radiation)Electrical sheet resistanceSi contentSEMIINSULATING POLYCRYSTALLINE SILICON; SOLAR-CELLS; 3RD-GENERATION PHOTOVOLTAICS; OPTICAL-PROPERTIES; AMORPHOUS-SILICON; THIN-FILMS; CRYSTALLINEOptical absorptionProbe methodElectrical resistivityAlloy depositionSputter depositionElectrical transportsymbolsOxygen-rich siliconRaman spectroscopyOptical gapReflectance spectrumPhotovoltaic
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Light absorption in silicon quantum dots embedded in silica

2009

The photon absorption in Si quantum dots (QDs) embedded in SiO2 has been systematically investigated by varying several parameters of the QD synthesis. Plasma-enhanced chemical vapor deposition (PECVD) or magnetron cosputtering (MS) have been used to deposit, upon quartz substrates, single layer, or multilayer structures of Si-rich- SiO2 (SRO) with different Si content (43-46 at. %). SRO samples have been annealed for 1 h in the 450-1250 °C range and characterized by optical absorption measurements, photoluminescence analysis, Rutherford backscattering spectrometry and x-ray Photoelectron Spectroscopy. After annealing up to 900 °C SRO films grown by MS show a higher absorption coefficient a…

SOLAR-CELLSPhotoluminescenceMaterials scienceEFFICIENCYSiliconAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_elementChemical vapor depositionOPTICAL-PROPERTIESRutherford backscattering spectrometryFILMSSettore ING-INF/01 - Elettronica3RD-GENERATION PHOTOVOLTAICSSettore FIS/03 - Fisica Della MateriaMULTIPLE EXCITON GENERATIONchemistryX-ray photoelectron spectroscopyPlasma-enhanced chemical vapor depositionQuantum dotRAY PHOTOELECTRON-SPECTROSCOPYLUMINESCENCESI NANOCRYSTALSCOEFFICIENTAbsorption (electromagnetic radiation)
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